The Small-Batch-Cluster architecture offered on the
Axcela™ System make this PVD tool an excellent choice for the deposition of Nanofilms:
- Rotating wafers enable uniform coverage
- Precise deposition control with less than a mono layer variation
- Multiple target configuration for more flexible film stack
Examples:
- Continuous Ta, Ru and Cu nano films with good uniformity
- Thinnest film deposited 20A
- Dense films
